Specification:
| Name | Cerium(IV) oxide, Ceric Dioxide, Cerium oxide nanopowder |
| Formula | CeO2 |
| CAS No. | 1306-38-3 |
| Particle Size | 50nm |
| Purity | 99.9% |
| Appearance | Light yellow powder |
| Package | 1kg,5kg per bag or as required |
| Main pplications | Catalyst, polishing, additives, ultraviolet abosorbent, etc.. |
| Dispersion | Can be customized |
Description:
Application of cerium dioxide/CeO2 nanoparticle:
(1) Ceric dioxide nanopowder for polishing: Nano cerium oxide is currently the most commonly used abrasive for glass polishing. It is widely used in precision processing of glass and optical components and has been extensively studied. What affects the polishing effect in the polishing powder is the particle size, purity and hardness of CeO2. The particle size is the main factor. The large particle size is suitable for the polishing of ordinary optical components and spectacle lenses, while the small particle size is suitable for the high-speed polishing of fine optical lenses.
For example: As the most common and basic inorganic material, glass is widely used in pen-notebook computer hard disk glass substrates, digital camera chips, ultra-precision optical lenses, optical windows and other optical components, as well as optical communication components, flat-panel displays and other advanced electronics. Ultra-smooth, sub-nanometer roughness, flat glass surface without micro-defects has become an important factor related to the performance of these high-tech products. Chemical mechanical polishing (CMP) is an important part of the silicon wafer processing and the entire deposition and etching process in the production of integrated circuits. It uses the mechanical polishing effect of the ultrafine abrasive particles in the CMP slurry and the chemical corrosion effect of the slurry. The optical disc forms a highly flat surface on the silicon wafer on which the circuit pattern has been made. It is currently a new technology that can provide global flattening in the manufacturing process of VLSI circuits.
(2) Nano-cerium dioxide used for catalyst has good redox performance. Cerium oxide nanopowder not only has unique oxygen storage and oxygen release functions, but also is the most active oxide catalyst in the rare earth oxide series. Therefore, nano ceria can be used as an auxiliary agent to improve the catalytic performance of the catalyst in many occasions.
(3) Ceric oxide nano particle used in the steel industry: Using nano-cerium oxide as a coating and additive can improve the oxidation resistance, hot corrosion, water corrosion and vulcanization properties of high-temperature alloys and stainless steel, and can also be used as an inoculant for ductile iron.
(4) Cerium oxide nano powder can be used in ultraviolet absorbing products because nano CeO2 has abundant electronic transition energy levels, excellent optical sensitivity to ultraviolet light absorption. Coupled with the small size effect, high specific surface effect, and macroscopic quantum effect of nanoparticle, CeO2 nano has strong scattering and reflection effects on ultraviolet light. Moreover, CeO2 has good thermal stability, safety and non-toxicity, abundant resources, and low preparation cost, so it is expected to become a new type of ultraviolet absorber applied in various fields.
Storage Condition:
Nano Cerium(IV) oxide/CeO2 Cerium oxide powder should be stored in sealed, avoid light, dry place. Room temperature storage is ok.
SEM :
